Category:Lithography (microfabrication)

Subcategories

This category has the following 8 subcategories, out of 8 total.

Media in category "Lithography (microfabrication)"

The following 117 files are in this category, out of 117 total.

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  16 nm hp Patterning Cost Comparison.png 751 × 288; 13 KB
  
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  193i continuation.PNG 621 × 442; 20 KB
  
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  1D SADP single mask.png 330 × 262; 1 KB
  
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  1st order obscuration.png 658 × 692; 24 KB
  
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  1x nm hp double patterned cuts.png 360 × 485; 10 KB
  
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  26 nm pitch vs 52 nm pitch with obscuration.png 811 × 361; 48 KB
  
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  27 nm pitch cut patterning.png 241 × 441; 4 KB
  
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  2D Illumination requirement.png 865 × 574; 23 KB
  
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  36 nm pitch 2-bar CD delta vs focus.png 481 × 288; 8 KB
  
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  36 nm pitch vertical line T2T.png 478 × 296; 9 KB
  
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  4X-nm hp SMO.png 1,269 × 283; 146 KB
  
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  7nm node metal pattern shifts through EUV focus.png 514 × 267; 11 KB
  
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  Assist feature OPC.png 482 × 290; 17 KB
  
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  Asymmetric 2D SAQP with LE2 block.png 601 × 378; 7 KB
  
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  Binary vs PSM NILS.png 481 × 289; 10 KB
  
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  Borodovsky challenge LELELE.png 451 × 262; 2 KB
  
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  CD 3s vs dose.png 589 × 384; 22 KB
  
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  CD sensitivity to multilayer buried defect.png 468 × 289; 7 KB
  
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  Contrast reduction vs photon noise.png 321 × 306; 51 KB
  
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  Converging number of cuts.png 482 × 295; 10 KB
  
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  Creating the PDMS master.svg 392 × 567; 4 KB
  
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  Cut exposure reduction.png 1,030 × 361; 150 KB
  
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  Cut overlay issues.png 441 × 393; 11 KB
  
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  Defocus of subresolution assist features.png 654 × 288; 19 KB
  
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  Defocus pattern shift vs wavelength.png 591 × 297; 20 KB
  
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  Depth-of-focus.JPG 417 × 251; 15 KB
  
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  Different illumination angles different images.png 613 × 487; 303 KB
  
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  DUV vs EUV line edge variability.png 1,126 × 236; 55 KB
  
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  EUV 2D edge stochastic variability.png 564 × 274; 272 KB
  
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  EUV contact-to-contact area variation.png 767 × 481; 49 KB
  
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  EUV dose increase for smaller size.png 492 × 292; 10 KB
  
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  EUV High-NA stochastic sidelobes.png 480 × 289; 16 KB
  
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  EUV mask defect printability.png 525 × 264; 25 KB
  
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  EUV stochastic EPE.png 559 × 288; 17 KB
  
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  EUV Stochastic Hot Spots.png 309 × 289; 42 KB
  
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  EUV vs DUV image shot noise.png 480 × 157; 27 KB
  
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  EUVL printable defects.png 593 × 289; 13 KB
  
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  EVG 120 resist coater-developer at LAAS 0434.jpg 3,872 × 2,592; 4.24 MB
  
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  Extended double patterning.PNG 621 × 385; 12 KB
  
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  Feature stitching across fields.png 409 × 233; 6 KB
  
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  FIB Microhole Arrays.tif 1,280 × 960; 1.19 MB
  
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  Fotolitograafia.png 360 × 480; 17 KB
  
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  H and V shadowing across EUV slit.png 565 × 263; 16 KB
  
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  High-NA EUV forbidden illumination combinations.png 387 × 354; 30 KB
  
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  Honeycomb structure patterning.png 424 × 384; 12 KB
  
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  Image shift vs illumination pole.png 1,129 × 606; 67 KB
  
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  Impact of electron spread function.png 625 × 289; 17 KB
  
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  Inking and Contact Process.JPG 478 × 580; 28 KB
  
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  Inking and contact process.svg 403 × 580; 4 KB
  
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  LIGA-Process-00.png 1,183 × 3,224; 508 KB
  
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  Litografia elettronica.jpg 1,055 × 313; 28 KB
  
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  LitRo3.jpg 467 × 340; 31 KB
  
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  LitRo4.jpg 391 × 340; 16 KB
  
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  LitRo5.jpg 562 × 340; 29 KB
  
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  LitRo6.jpg 556 × 340; 28 KB
  
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  Lower vs higher blur stochastics.png 1,157 × 330; 53 KB
  
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  Macrotimbre 2.png 906 × 710; 1.35 MB
  
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  Magnetic field assisted micro contact printing.png 1,352 × 713; 53 KB
  
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  Mask-assisted spacer self-trimming.png 1,177 × 287; 10 KB
  
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  Microfabrication NFP.tif 338 × 561; 44 KB
  
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  Microfabrication of Nanofountain probe.svg 338 × 561; 27 KB
  
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  Micropatterns-fibronectin-glass.png 848 × 694; 181 KB
  
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  Micropatterns-fibronectin-glass.tif 848 × 694; 575 KB
  
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  Multipatterning-friendly layout.png 532 × 296; 7 KB
  
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  Nanoimprint proximity effect.jpeg 643 × 512; 32 KB
  
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  Nanojäljendlitograafia.jpg 620 × 780; 53 KB
  
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  Nanosize 3D model of a vintage ZEISS microscope, by Nanoscribe (29829841445).jpg 1,457 × 970; 206 KB
  
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  Node progress.png 1,571 × 313; 27 KB
  
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  Non-telecentricity.png 817 × 499; 49 KB
  
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  NXE3400 TPT vs dose.png 480 × 289; 9 KB
  
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  Optical proximity correction.png 518 × 762; 4 KB
  
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  Outgassing contamination vs dose.png 454 × 279; 13 KB
  
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  Overview 3.jpg 767 × 576; 84 KB
  
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  P28 dipole leaf image fading.png 481 × 289; 18 KB
  
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  PDMS polümeerist muster mikrokontaktprintimise jaoks.tif 1,536 × 1,094; 1.62 MB
  
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  PDMS stamp defect.svg 774 × 209; 1 KB
  
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  PDMS stamp defects.JPG 774 × 209; 12 KB
  
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  Pellicle Mounting Machine MLI.jpg 425 × 319; 49 KB
  
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  Photoelectron trajectories vs dose.png 1,003 × 224; 21 KB
  
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  Photolithography 2.JPG 534 × 436; 30 KB
  
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  Photoresist spin-coaters at LAAS 0448.jpg 3,872 × 2,592; 3.54 MB
  
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  Projected cost trend of SADP.png 481 × 289; 8 KB
  
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  Protocol for magnetic stamp.png 1,445 × 879; 73 KB
  
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  SAQP flow for SAB.png 1,166 × 1,089; 24 KB
  
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  SAQP over SADP.png 432 × 232; 17 KB
  
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  Scattered light from phase defect.JPG 442 × 309; 28 KB
  
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  Screenshot 20230216 130758 PowerPoint.jpg 1,464 × 1,063; 185 KB
  
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  Secondary electron depth in resist.png 481 × 289; 9 KB
  
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  Secondary Electrons from Layers under EUV Resist.png 1,403 × 333; 88 KB
  
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  Self-aligned via patterning.png 990 × 309; 16 KB
  
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  Self-trimming with isotropic etch.png 391 × 465; 7 KB
  
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  Shot noise CD variation.png 424 × 442; 20 KB
  
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  SID-SIM-SID SAQP LE Asymmetric.png 601 × 378; 7 KB
  
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  Sidewall profile modulation.png 1,120 × 399; 27 KB
  
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  Single-mask SID SADP.png 332 × 291; 4 KB
  
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  Soft lithography proc 1.jpg 570 × 331; 23 KB
  
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  Soft lithography proc 2.jpg 575 × 323; 22 KB
  
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  Soft lithography proc1.svg 600 × 335; 3 KB
  
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  Soft lithography proc2.svg 600 × 335; 4 KB
  
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  Sorg impatto elettronico.jpg 674 × 417; 20 KB
  
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  Spectrum of lithography lights.PNG 1,150 × 350; 104 KB
  
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  Spin-coater for resist coating (DE).svg 800 × 600; 23 KB
  
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  Spinner.jpg 641 × 823; 63 KB
  
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  Spread of electrons outside EUV exposure area.png 662 × 528; 328 KB
  
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  StencilLithography.jpg 942 × 179; 19 KB
  
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  Stitch Double Patterning.png 865 × 398; 8 KB
  
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  Stochastic overlay.png 701 × 356; 87 KB
  
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  Strukturbreiten (Prozessoren) über Zeit EN.svg 4,557 × 1,481; 24 KB
  
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  Strukturbreiten über Zeit DE.svg 4,557 × 1,481; 24 KB
  
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  Sub-0.5 k1 brick pattern.png 372 × 267; 29 KB
  
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  Thermal polymer decomp.tiff 656 × 245; 27 KB
  
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  Undersized contact.png 210 × 607; 85 KB
  
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  Via Triple Patterning for EUV.png 211 × 444; 7 KB
  
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  Wafertraksystem.jpg 2,048 × 1,536; 577 KB
  
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  Wavelength dependence of shot noise.png 620 × 515; 27 KB
  
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  Wider T2T SID.png 345 × 404; 5 KB
  
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  Write erase bit.tiff 404 × 182; 22 KB